Imec has made significant progress in preparing the High-NA patterning ecosystem for the imec-ASML Joint High-NA Lab, which will be centred around the first 0.55NA extreme ultraviolet (EUV) lithography prototype tool. Advances are reported in developing patterning and etch processes, in screening new resist and underlayer materials, in improving metrology and in photomask technology. “Imec is ...

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