EUV looking to 225wph

At last month’s Imec Technology Conference, ASML’s CEO Martin van den Brink  revealed that the company has a route to get EUV to 225 wph while the productivity of immersion lithography has doubled over the last nine years.   11 million EUV wafers have been  exposed and 57 3400x EUV systems have been shipped, said van ...

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