VLSI Symposia: Samsung eyes EUV for mainstream chip-making at 7nm

At VLSI 2018, Samsung unveiled its forthcoming 7nm FinFET platform technology, said to be the first mainstream semiconductor manufacturing technology to use extreme ultraviolet (EUV) lithography for single-patterning of middle- and back-end-of-the line features – EUV is expected to offer better pattern uniformity and cost advantages versus standard multiple-patterning approaches for extreme scaling. by Gary ...

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